منابع مشابه
Wet-Chemical Etching and Cleaning of Silicon
A Introduction Research and manufacturing related to silicon devices, circuits, and systems often relies on the wet-chemical etching of silicon wafers. The dissolution of silicon using liquid solutions is needed for deep etching and micromachining, shaping, and cleaning. Also, wet-chemistries are often used for defect delineation in single crystal silicon materials. In this paper, a review of t...
متن کاملOptimization of Chemical Texturing of Silicon Wafers Using Different Concentrations of Sodium Hydroxide in Etching Solution
In this paper, the morphology of chemically etched silicon with various concentration is reported. The surface of Silicon (100) has pyramidal structures which can be used for anti-reflection applications in solar cells. Pyramidal structures can capture incident sun light therefore can enhance the efficiency of silicon solar cells. The structure of silicon pyramid was studied using scanni...
متن کاملMultiscale modeling of anisotropic wet chemical etching of crystalline silicon
– We combine ab initio and Monte Carlo simulations in multiscale modelling of anisotropic wet chemical etching of silicon. The anisotropy of the macroscopic etching patterns observed in the experiments is explained by two mechanisms at an atomistic scale: the weakening of backbonds following OH termination of surface sites and the existence of significant interaction between the surface-termina...
متن کاملHierarchical silicon nanostructured arrays via metal-assisted chemical etching
Department of Physics and Materials Scien Chee Avenue, Kowloon Tong, Kowloon, Hon Department of Biology and Chemistry, Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Centre for Functional Photonics (CFP), Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Shenzhen Research Institute, City Universit † Electronic supplementary informa 10.1039/c4ra06172a ‡ These authors contributed equally to th Cite this: ...
متن کاملMetal-assisted chemical etching in HFÕH2O2 produces porous silicon
A simple and effective method is presented for producing light-emitting porous silicon ~PSi!. A thin (d,10 nm! layer of Au, Pt, or Au/Pd is deposited on the ~100! Si surface prior to immersion in a solution of HF and H2O2 . Depending on the type of metal deposited and Si doping type and doping level, PSi with different morphologies and light-emitting properties is produced. PSi production occur...
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ژورنال
عنوان ژورنال: Microscopy Today
سال: 1997
ISSN: 1551-9295,2150-3583
DOI: 10.1017/s1551929500060739